Mark your calendar for TechWave 2010, Sybase’s premier user education & training event:

August 9-11, 2010
Hilton Washington
Washington, DC

Top Five Reasons to Attend TechWave

• Technical training & education at a fraction of the usual cost
• First look at new product features and roadmaps
• Tabletop exhibits from key Sybase partners
• Virtual tech support provided by Sybase experts
• Extensive networking opportunities

Registration for TechWave 2010 is now open!  The first day of the conference, including keynotes, plenary sessions, and introductory technical content, is free to all pre-registered attendees. The cost to attend the full conference, which includes two full days of technical training comprised of over 150 hour-long breakout sessions, is $600.  

Click here to view the full conference schedule, create your personal agenda, and register.

Additional Intensive Hands-on Training Opportunity - TechWave Pre-Conference and Post-Conference Courses
August 7- 8 and August 12-13 at the Bethesda Learning Center

Sybase Education is offering two-day long lab-intensive technical sessions on the latest releases of PowerBuilder .Net 12 and Sybase IQ 15, taught by Certified Sybase Professional instructors.  Click here for more information including course descriptions, pricing, and registration. The PowerBuilder pre-conference course has sold out but a post-conference course, taking place August 12-13, has just been added!

Note: registration for these courses is separate from TechWave registration and transportation to/from the Washington Hilton is not included.

TechWave Conference Agenda

The conference will be comprised of keynotes, plenary sessions, and introductory technical breakouts on Monday, followed by hour-long technical breakout sessions all day Tuesday and Wednesday.

Click here for a description of the TechWave Conference product tracks.

Click here to view the complete list of sessions.  View the searchable Sybase TechWave Session Catalog to find the topics and sessions of greatest interest for you.